二甲基硒醚, 99%

Dimethyl selenide

异丙醇铝, ≥99.8%

Aluminium isopropoxide

水, 用于GC顶空测试

Water

三（降冰片二烯）（乙酰丙酮）铱（III）

Tris(norbornadiene)(acetylacetonato)iridium(III)

99%,99.9%-Ir

异丙醇铝, 99.9% metals basis

Aluminium isopropoxide

（N，N-二乙基二硫代氨基甲酸酯）二甲基金（III）

(N,N-Diethyldithiocarbamato)dimethylgold(III)

98%,99.999.9%-Au

二（异丙基环戊二烯基）镍

Bis(i-propylcyclopentadienyl)nickel

≥99%

二氯化双（五甲基环戊二烯基）铪

Bis(pentamethylcyclopentadienyl)hafnium dichloride

≥99%

三(2,2,6,6-四甲基-3,5-庚二酮酸)铒(III), ≥99.9% trace metals basis

Erbium(III) tris(2,2,6,6-tetramethyl-3,5- heptanedionate)

二羰基双（N，N-二叔丁基乙酰胺基）钌（II）

Bis(N,N-di-t-butylacetamidinato)ruthenium(II) dicarbonyl

99%,99.9%-Ru

双（2,2,6,6-四甲基-3,5-庚二酮基）钡四甘醇二甲酸酯加合物

Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium tetraglyme adduct

99.9%-Ba, Sr-0.5%

三氟乙酰丙酮镍二水合物

Nickel(II) trifluoroacetylacetonate dihydrate

99%

双[4,4,4-三氟-1-（2-噻吩基-1,3-丁二酮）锌TMEDA加合物

Bis[4,4,4-trifluoro-1-(2-thienyl-1,3-butanedionato]zinc TMEDA adduct

99.9%

水, 细胞培养用注射级

Water

六（乙基氨基）乙硅烷

Hexakis(ethylamino)disilane

99.998%-Si

双（1,4-二叔丁基-1,3-二氮杂丁二烯基）钴（II）Co（DAD）2

Bis(1,4-di-t-butyl-1,3-diazabutadienyl)cobalt(II) Co(DAD)2

99%,99.999.9%-Co

二甲基双(环戊二烯)铪(IV), 98%

Dimethylbis(cyclopentadienyl)hafnium(IV)

水, 细胞培养级

Water

三（2,2,6,6-四甲基-3,5-庚二酮基）铟（III）

Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)indium(III)

99.9%,99.9%-In

水, for HPLC,AA, IC, ICP and TOC analysis

Water