Bis-Tris-HCl缓冲液, 1.25M,pH6.5-6.8,过滤除菌,无酶

Bis-Tris-HCl Buffer

Bis-Tris丙烷缓冲液, 0.2M,pH6.5

Bis-Tris Propane Buffer

Bis-Tris丙烷缓冲液, 0.2M,pH7.4

Bis-Tris Propane Buffer

Bis-Tris丙烷缓冲液, 0.2M,pH8.0

Bis-Tris Propane Buffer

Bis-Tris丙烷缓冲液, 0.2M,pH8.5

Bis-Tris Propane Buffer

Bis-Tris丙烷缓冲液, 0.2M,pH9.0

Bis-Tris Propane Buffer

Bis-Tris缓冲液, 0.2M,pH6.5

Bis-Tris Buffer

Bis-Tris缓冲液, 0.2M,pH7.4

Bis-Tris Buffer

BL21 (DE3) 化学感受态细胞,

BL21 (DE3) Chemically Competent Cells

Blotto-消泡剂PBS溶液,

Blotto-Antifoam in PBS

2-[5-(三氟甲基)-1H-1,2,4-三唑-3-基]吡啶, ≥99%

2-[5-(Trifluoromethyl)-1H-1,2,4-triazol-3-yl]pyridine

二硼化钽, 99.5%

Tantalum boride

六硼化镧, 99.98%

Lanthanum hexaboride

六硼化镧, 500 目, 99.9%

Lanthanum hexaboride

硼化钨, 99.9%

Tungsten boride

硼化铪, 99.9% (metals basis excluding Zr), Zr <2%

Hafnium boride

氯代(环戊二烯基)[双(二苯基膦)甲烷]钌(ii), 99%

Chloro(cyclopentadienyl)[bis(diphenylphosphino)methane]ruthenium(II)

钌(1+), 四(乙腈)[2-[(二甲胺基-κN)甲基]苯基-κC]-, (OC-6-32)-, 六氟磷酸盐(1-) (1:1), 98%

Ruthenium(1+), tetrakis(acetonitrile)[2-[(dimethylamino-κN)methyl]phenyl-κC]-, (OC-6-32)-, hexafluorophosphate(1-) (1:1)

钌碳, Ru 5%

Ruthenium on carbon

钌粉, 99.9% metals basis

Ruthenium